Atomic layer deposition of materials for phase-change memories
Markku Leskelä, Viljami Pore, et al.
ECS Meeting 2009
Resistivity versus temperature measurements and time-resolved x-ray diffraction were used to study Ge-Te phase change materials. Resistivity versus temperature measurements showed one sharp drop in resistivity for films with 30, 50, and 70 at. % Ge, two steps for films with 40 at. % Ge, and a gradual transition for films with 60 at. % Ge. Films with 30, 50, and 70 at. % Ge crystallized in a single-step process with GeTe and Te, only GeTe, and GeTe and Ge diffraction peaks, respectively. Films with 40 and 60 at. % Ge crystallized in a two-step process with GeTe peaks appearing first and additional Te or Ge peaks, respectively, appearing at higher temperature. © 2009 American Institute of Physics.
Markku Leskelä, Viljami Pore, et al.
ECS Meeting 2009
Yuan Zhang, Simone Raoux, et al.
MRS Spring Meeting 2008
Geoffrey W. Burr, Matthew BrightSky, et al.
IEEE JESTCS
Mikko Ritala, Viljami Pore, et al.
Microelectronic Engineering