Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
A multiple-wavenumber analysis method for scanned-angle photoelectron holography is refined to image the near-surface atoms at a Cu(001) crystal face. The atoms one layer above the emitter are imaged at the appropriate location although shifted by 0.2Å. To strengthen this analysis, a comparison is made with a simple model which gives a similar result. A theoretical study is also presented that demonstrates why a holographic analysis scheme for scanned-angle diffraction patterns tends to preferentially image forward scattering atoms unlike scanned-energy variants of holographic atom imaging. © 1995.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Q.R. Huang, Ho-Cheol Kim, et al.
Macromolecules
Heinz Schmid, Hans Biebuyck, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Fernando Marianno, Wang Zhou, et al.
INFORMS 2021