Conference paper
Optimization of real phase-mask performance
F.M. Schellenberg, M. Levenson, et al.
BACUS Symposium on Photomask Technology and Management 1991
Phase conjugate wavefront generation by degenerate four-wave mixing has been used to project images with spatial resolution greater than 500 line pairs per millimeter. The nonlinear medium, a solution of rhodamine 6G in acetone, produced the images by forced Rayleigh scattering. These images were bright enough to expose photoresist in 30 sec and their quality was adequate for fine-line lithography and consistent with theoretical expectations.
F.M. Schellenberg, M. Levenson, et al.
BACUS Symposium on Photomask Technology and Management 1991
W. Zapka, M. Levenson, et al.
Optics Letters
D.E. Nitz, A.V. Smith, et al.
Physical Review A
B.L. Schumaker, S.H. Perlmutter, et al.
Physical Review Letters