PaperEffects of mask materials on near field optical nanolithographySharee J. McNab, Richard J. BlaikieMaterials Research Society Symposium - Proceedings
Conference paperX-ray lithography induced radiation effects in deep submicron CMOS devicesL.K. Wang, A. Acovic, et al.MRS Spring Meeting 1993
PaperFabrication of Si/SiGe quantum point contacts by electron-beam lithography and shallow wet-chemical etchingU. Wieser, U. Kunze, et al.Physica E: Low-Dimensional Systems and Nanostructures
Conference paperInterface state generation in pFETs with ultra-thin oxide and oxynitride on (100) and (110) Si substratesJ.H. Stathis, R. Bolam, et al.INFOS 2005