Journal of Applied Physics

Paper

01 Dec 1988

Plasma-assisted etching of tungsten films: A quartz-crystal microbalance study

View publication

Abstract

The plasma-assisted etching of magnetron-sputtered polycrystalline tungsten films in CF4-H2 and CF4-O2 glow discharges has been studied as a function of ion energy using quartz-crystal microbalance methods supplemented by vacuum-transfer Auger electron spectroscopy and actinometric emission spectroscopy.

Related

Paper

Ion-induced volatilization (IIV): A method for quantitative measurement of the amounts of perfluoropolyether lubricant on a particulate disk surface and in the media porosity

J.W. Coburn, H.F. Winters

Journal of Applied Physics

Paper

Diagnostics of an r.f. sputtering glow discharge - correlation between atomic absorption and mass spectrometry

E.W. Eckstein, J.W. Coburn, et al.

International Journal of Mass Spectrometry and Ion Physics

Paper

Summary Abstract: Diagnostics in plasma processing

J.W. Coburn

JVSTA

Paper

Electron-beam effects in depth profiling measurements with Auger electron spectroscopy

J. Ahn, C.R. Perleberg, et al.

Journal of Applied Physics

View all publications