Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
This paper studies batch arrival MX/G/1 priority queues without and with (multiple or single) vacations. Applying the delay busy cycle analysis, we explicity derive the Laplace-Stieltjes transforms and the first two moments of the waiting time distributions for the nonpreemptive (head-of-the-line) and preemptive resume priority queues. Conservation laws for batch arrival systems are also mentioned. The results in this paper cover many previous results as special cases. © 1991.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Corneliu Constantinescu
SPIE Optical Engineering + Applications 2009
Richard M. Karp, Raymond E. Miller
Journal of Computer and System Sciences
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004