Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
Scanning probe nanolithography (SPL) has demonstrated its potential in a variety of applications like 3D nanopatterning, 'direct development' lithography, dip-pen deposition or patterning of self-assembled monolayers. One of the main issues holding back SPL has been the limited throughput for patterning and imaging. Here we present a complete lithography and metrology system based on thermomechanical writing into organic resists. Metrology is carried out using a thermoelectric topography sensing method. More specifically, we demonstrate a system with a patterning pixel clock of 500kHz, 20mms - 1 linear scan speed, a positioning accuracy of 10nm, a read-back frequency bandwidth of 100 000line-pairss- 1 and a turnaround time from patterning to qualifying metrology of 1min. Thus, we demonstrate a nanolithography system capable of implementing rapid turnaround. © 2011 IOP Publishing Ltd.
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
Frank R. Libsch, Takatoshi Tsujimura
Active Matrix Liquid Crystal Displays Technology and Applications 1997
J.V. Harzer, B. Hillebrands, et al.
Journal of Magnetism and Magnetic Materials
Surendra B. Anantharaman, Joachim Kohlbrecher, et al.
MRS Fall Meeting 2020