PaperRadical polymerization of N‐phenyl‐α‐methylene‐β‐lactamMitsuru Ueda, Hideharu Mori, et al.Journal of Polymer Science Part A: Polymer Chemistry
Conference paperIntegration of polymer self-assembly for lithographic applicationJoy Y. Cheng, Daniel P. Sanders, et al.SPIE Advanced Lithography 2008
PaperThermally Developable, Positive Resist Systems with High SensitivityHiroshi Ito, Reinhold SchwalmJES
PaperHigh speed silicon lateral trench detector on SOI substrateMin Yang, Jeremy Schaub, et al.Technical Digest-International Electron Devices Meeting
