P. Buchmann, H. Kaufmann, et al.
SPIE International Technical Symposium/Europe 1985
Very small area, alloyed ohmic contacts on n+-GaAs etched mesas have been fabricated and their resistance measured. The nominal contact size ranges from 10 down to 0.1 μm on a side. The data show an extremely large increase of the resistance spread as the contact size is reduced. Grain size effects in the alloyed contacts and dead zones due to ion etching are discussed as possible causes for the observations.
P. Buchmann, H. Kaufmann, et al.
SPIE International Technical Symposium/Europe 1985
P. Guéret
Ultramicroscopy
P. Guéret
Journal of Applied Physics
P. Guéret, C. Rossel, et al.
Journal of Applied Physics