Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
This paper describes a clustered multiprocessor system developed for the general-purpose, large-scale commercial marketplace. The system (S/390® Parallel Sysplex™) is based on an architecture designed to combine the benefits of full data sharing and parallel processing in a highly scalable clustered computing environment. The Parallel Sysplex offers significant advantages in the areas of cost, performance range, and availability.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
M.J. Slattery, Joan L. Mitchell
IBM J. Res. Dev
Oliver Bodemer
IBM J. Res. Dev
Maurice Hanan, Peter K. Wolff, et al.
DAC 1976