PaperCl2-based inductively coupled plasma etching of CoFeB, CoSm, CoZr and FeMnK.B. Jung, H. Cho, et al.Materials Science and Engineering B: Solid-State Materials for Advanced Technology
PaperHigh density plasma etching of NiFe, NiFeCo and NiMnSb-based multilayers for magnetic storage elementsK.B. Jung, J. Hong, et al.Applied Surface Science
PaperInterhalogen plasma chemistries for dry etch patterning of Ni, Fe, NiFe and NiFeCo thin filmsH. Cho, K.B. Jung, et al.Applied Surface Science
