Magnetic properties of ultra-thin NiFe films
S. Franz, M. Bestetti, et al.
ECS Meeting 2004
Fine lines of 1.5-μm-wide and 80-nm-thick Co were patterned by a lithographic technique and deposited by electron gun onto (100) Si surfaces. Reacting the Co and Si to form CoSi2 lines was carried out at 600°C in He atmosphere. The composite surface consisting of alternating silicides and Si as seen by scanning electron microscopy showed qualitatively that the silicide lines have sunk completely into the Si and the entire surface appears planar. Quantitative changes in vertical direction before and after the formation of the silicide lines have been measured by atomic force microscopy.
S. Franz, M. Bestetti, et al.
ECS Meeting 2004
K.N. Tu
Thin Solid Films
D. Gupta, K.N. Tu, et al.
Physical Review Letters
K.N. Tu, R.D. Thompson, et al.
Applied Physics Letters