M.D. Thouless, E. Olsson, et al.
Acta Metallurgica Et Materialia
We report on the preparation of YBCO thin films by single target ion-beam deposition. A YBCO film deposited in-Situ on LaAI03, at a substrate temperature of 675°C and assisted by an atomic oxygen source, had a Tc of 80K. A YBCO film deposited in-Situ on LaAI03, at a substrate temperature of 750°C and assisted by a molecular oxygen source, had a Tcof 83K. A YBCO film deposited on a room temperature MgO substrate and followed by exsitu post annealing had a Tcof 80K. The properties of these films were studied through microscopy, stoichiometry, x-ray diffraction, Auger analysis and Tcmeasurements. © 1991 IEEE
M.D. Thouless, E. Olsson, et al.
Acta Metallurgica Et Materialia
A.G. Schrott, J.A. Mishwich, et al.
Materials Research Society Symposium - Proceedings
J.R. Kirtley, C.C. Tsuei, et al.
Turkish Journal of Physics
G. Koren, R.J. Baseman, et al.
Applied Physics Letters