Conference paper
Impact of thin resist processes on post-etch LER
Arpan P. Mahorowala, Dario L. Goldfarb, et al.
Microlithography 2003
The relative rates of varying Nb/Nb-TBE monomer feed ratios were evaluated by using real-time monitoring via in-situ FTIR spectroscopy of alternating copolymerizations of MA with Nb and Nb-TBE. Pseudo first order kinetic plots constructed from the in-situ FTIR absorbance data indicated that the rate of reaction is a strong function of the Nb/Nb-TBE ratio and decreased with increasing Nb-TBE.
Arpan P. Mahorowala, Dario L. Goldfarb, et al.
Microlithography 2003
Anuja De Silva, Linda K. Sundberg, et al.
Chemistry of Materials
Linda K. Sundberg, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2007
Narayan Sundararajan, Christopher F. Keimel, et al.
J. Photopolym. Sci. Tech.