Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
The expressive power of the data flow schemes of Dennis is evaluated. It is shown that data flow schemes have the power to express an arbitrary determinate functional. The proof involves a demonstration that “restricted data flow schemes” can simulate Turing Machines. This provides a new. simple basis for computability. © 1980, All rights reserved.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Robert Manson Sawko, Malgorzata Zimon
SIAM/ASA JUQ
Ronen Feldman, Martin Charles Golumbic
Ann. Math. Artif. Intell.
Guo-Jun Qi, Charu Aggarwal, et al.
IEEE TPAMI