Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
It is shown that there is a positive lower bound, c, to the uniform error in any scheme designed to recover all functions of a certain smoothness from their values at a fixed finite set of points. This lower bound is essentially attained by interpolation at the points by splines with canonical knots. Estimates of c are also given. © 1976 Springer-Verlag.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Renu Tewari, Richard P. King, et al.
IS&T/SPIE Electronic Imaging 1996
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
A. Grill, B.S. Meyerson, et al.
Proceedings of SPIE 1989