Some experimental results on placement techniques
Maurice Hanan, Peter K. Wolff, et al.
DAC 1976
Given the horizontal and vertical projections of a finite binary pattern f, can we reconstruct the original pattern f? In this paper we give a characterization of patterns that are reconstructable from their projections. Three algorithms are developed to reconstruct both unambiguous and ambiguous patterns. It is shown that an unambiguous pattern can be perfectly reconstructed in time m × n and that a pattern similar to an ambiguous pattern can also be constructed in time m × n, where m, n are the dimensions of the pattern frame. © 1971, ACM. All rights reserved.
Maurice Hanan, Peter K. Wolff, et al.
DAC 1976
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
Alfonso P. Cardenas, Larry F. Bowman, et al.
ACM Annual Conference 1975
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