Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Using time-resolved luminescence we measure the energy relaxation of excitons in thin quantum wells. We find that the excitons relax by losing potential energy in a drift-diffusion motion driven by potential fluctuations in the quantum well plane, which are longer than the coherence length of the excitons. For a constant interface quality the coherence length strongly decreases with decreasing well width so that drift-diffusion dominates the exciton relaxation in thin quantum wells. © 1992.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
I.K. Pour, D.J. Krajnovich, et al.
SPIE Optical Materials for High Average Power Lasers 1992
Ming L. Yu
Physical Review B
A. Reisman, M. Berkenblit, et al.
JES