Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
A tool for helping system engineers configure VM/370 systems Is described It consists of,a data reductmn package that produces a workload characterization from VM/370,Momtor data, and an analytic model that accepts the workload characterlzatmn as an,input, and provides estimated performance measures as outputs The tool is easy to use,and routinely achmves accuracy levels within 5 percent for utihzatmns and 30 percent for,response times. © 1978, ACM. All rights reserved.
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
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