The DX centre
T.N. Morgan
Semiconductor Science and Technology
The roughness of spin-cast polymer films arises from thermally activated capillary waves during preparation and typically amounts to about 0.5 nm rms measured on a micrometer-sized surface area. Templating from atomically flat mica substrates allows the creation of polymer films with a surface roughness approaching the molecular scale. Three regimes of spatial frequencies are identified in which the roughness is controlled by different physical mechanisms. We find that frozen-in elastic pressure waves ultimately limit the flatness of polymer films. © 2009 American Chemical Society.
T.N. Morgan
Semiconductor Science and Technology
Frank Stem
C R C Critical Reviews in Solid State Sciences
Sang-Min Park, Mark P. Stoykovich, et al.
Advanced Materials
J.C. Marinace
JES