Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
We provide an O(n2log 1/δ) time randomized algorithm to check whether a given operation ο × S → S is associative (where n = |S| and δ > 0 is the error probability required of the algorithm). We prove that (for any constant δ) this performance is optimal up to a constant factor, even if the operation is 'cancellative'. No sub-n3 time algorithm was previously known for this task. More generally we give an O(nc) time randomized algorithm to check whether a collection of c-ary operations satisfy any given 'read-once' identity.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Preeti Malakar, Thomas George, et al.
SC 2012
N.K. Ratha, A.K. Jain, et al.
Workshop CAMP 2000
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007