Conference paper
Single and dual wavelength exposure of photoresist
J. LaRue, C. Ting
Proceedings of SPIE 1989
J. LaRue, C. Ting
Proceedings of SPIE 1989
Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011
M. Tismenetsky
International Journal of Computer Mathematics
Nimrod Megiddo
Journal of Symbolic Computation