A. Gupta, R. Gross, et al.
SPIE Advances in Semiconductors and Superconductors 1990
The oxidation of TbFeCo amorphous alloys in the temperature range 70-120°C is examined using XPS, optical and magnetic measurement techniques. As a consequence of this oxidation process, a complex structure is formed whose upper surface layer consists of oxides of Tb, Fe and Co. Below this oxidized structure (approximately 5 nm thick) is a region consisting of terbium oxide within which Fe and Co exist in their metallic states. This lower region significantly alters the magneto-optical properties of the thin films and the thickness of this region increases with annealing time. The kinetics of the process follows a parabolic law and is diffusion limited with an activation energy of 0.5±0.1 eV. The oxidation rate of TbFe is hindered by Co additions. This is not the result of Co segregation or preferential Co oxidation phenomena. © 1988.
A. Gupta, R. Gross, et al.
SPIE Advances in Semiconductors and Superconductors 1990
J.H. Kaufman, Owen R. Melroy, et al.
Synthetic Metals
J. Tersoff
Applied Surface Science
I.K. Pour, D.J. Krajnovich, et al.
SPIE Optical Materials for High Average Power Lasers 1992