A full E-beam 0.25 mu m bipolar technology with sub-25 ps ECL gate delay
- J. Warnock
- J.D. Cressler
- et al.
- 1991
- IEDM 1991
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20 results for P. Coane
Application of variable shaped electron beam technology to the development of 0.5 micron CMOS technology with extensions to 0.25 micron
- P. Coane
- P. Rudeck
- et al.
- 1989
- Microelectronic Engineering
Fully scaled 0.5 micron CMOS technology using variable shaped electron beam lithography
- Philip Coane
- Paul Rudeck
- et al.
- 1989
- Proceedings of SPIE 1989
Scanning electron beam method for examining surfaces in a short focal length magnetic lens
- A.N. Broers
- P. Coane
- 1986
- Applied Physics Letters
0. 5 MICRON GATE CMOS TECHNOLOGY USING E-BEAM/OPTICAL MIX LITHOGRAPHY.
- L.K. Wang
- Y. Taur
- et al.
- 1985
- VLSI Technology 1985
Electron beam / optical mixed lithography at half-micron ground rules
- P. Coane
- P. Rudeck
- et al.
- 1986
- Microelectronic Engineering
Soft X-ray microscopy at the NSLS
- J. Kenney
- J. Kirz
- et al.
- 1984
- Nuclear Instruments and Methods In Physics Research
Electron beam fabrication and characterization of fresnel zone plates for soft x-ray microscopy
- D. Kern
- P. Coane
- et al.
- 1989
- Proceedings of SPIE 1989
MEASURING THE FIELD FROM A MAGNETIC RECORDING HEAD IN THE SCANNING ELECTRON MICROSCOPE.
- O.C. Wells
- P. Coane
- et al.
- 1982
- Microbeam Analysis 1982
Electron beam testing and its application to packaging modules for very large scale integrated (vlsi) chip arrays
- F.J. Hohn
- T.H.P. Chang
- et al.
- 1989
- Proceedings of SPIE 1989