SUMMARY ABSTRACT: CHARACTERISTICS OF ORGANOSILICON POLYMERS IMMERSED IN GASEOUS PLASMAS.J. ParaszczakE. Babichet al.1984Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena
Multilayer resist systems using polysiloxanes as etch masksJ. ParaszczakJ.M. Shawet al.1983Microlithography 1983