Very low temperature (<400°C) silicon molecular beam epitaxy: The role of low energy ion irradiation
- M. V. Ramana Murty
- Harry A. Atwater
- et al.
- 1993
- Applied Physics Letters
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3 results for H.A. Atwater
Evolution of structural and magnetic properties in Ta/Ni 81Fe19 multilayer thin films
- I. Hashim
- H.A. Atwater
- et al.
- 1993
- Journal of Applied Physics
Radioactive Ni* tracer study of the nickel silicide growth mechanism
- J.E.E. Baglin
- H.A. Atwater
- et al.
- 1982
- Thin Solid Films