Plasma etching of Hf-based high- k thin films. Part II. Ion-enhanced surface reaction mechanisms
- Ryan M. Martin
- Hans-Olof Blom
- et al.
- 2009
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
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Summary Abstract: Resistivity-process relationships in TiSi2 formed from Ti-Si reaction couples
- H.-O. Blom
- S. Berg
- et al.
- 1985
- JVSTA