Formation of silicide thin films by solid state reaction
- P. Gas
- F.M. d'Heurle
- 1993
- Applied Surface Science
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23 results for P. Gas
Diffusion of elements implanted in amorphous titanium disilicide
- F.M. d'Heurle
- J.M. Cotte
- et al.
- 1993
- Applied Surface Science
Diffusion of dopants in tungsten disilicide: effects of diffusion paths
- O. Thomas
- G. Scilla
- et al.
- 1991
- Applied Surface Science
Understanding solid phase interactions: the use of tracer isotopes
- S.-L. Zhang
- F.M. d'Heurle
- et al.
- 1991
- Applied Surface Science
Diffusion of Sb, Ga, Ge, and (As) in TiSi2
- P. Gas
- G. Scilla
- et al.
- 1988
- Journal of Applied Physics
The diffusion of elements implanted in films of cobalt disilicide
- O. Thomas
- P. Gas
- et al.
- 1988
- Journal of Applied Physics
Diffusion of boron, phosphorus, and arsenic implanted in thin films of cobalt disilicide
- O. Thomas
- P. Gas
- et al.
- 1988
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Electrical measurement of the formation of the platinum-rich metal silicides by metal-silicon reaction
- P. Gas
- J. Tardy
- et al.
- 1987
- Applied Physics Letters
Disilicide solid solutions, phase diagram, and resistivities. II. TaSi 2-WSi2
- P. Gas
- J. Tardy
- et al.
- 1987
- Journal of Applied Physics
Formation of intermediate phases, Ni3Si2 and Pt 6Si5: Nucleation, identification, and resistivity
- P. Gas
- F.M. D'Heurle
- et al.
- 1986
- Journal of Applied Physics