Thermal stability of TiSi2 on mono- and polycrystalline siliconC.Y. WongL.K. Wanget al.1986Journal of Applied Physics
A Highly Latchup-Immune 1-μm CMOS Technology Fabricated with 1-MeV Ion Implantation and Self-Aligned TiSi2Fang-Shi J. LaiL.K. Wanget al.1986IEEE T-ED
Electron beam / optical mixed lithography at half-micron ground rulesP. CoaneP. Rudecket al.1986Microelectronic Engineering
HIGHLY LATCHUP-IMMUNE 1- mu m CMOS TECHNOLOGY FABRICATED WITH 1 Mev ION IMPLANTATION AND SELF-ALIGNED TiSi//2.F.S. LaiL.K. Wanget al.1984IEDM 1984
EFFECTS OF MeV IMPLANTATION ON THE CHARACTERISTICS OF p-n JUNCTIONS.L.K. WangG.P. Liet al.1984ECS Meeting 1984