Publications

8 results for Joseph S. Logan

Copper deposition by electron cyclotron resonance plasma
- - A. Sugerrnan
  - F.E. Turene
  - et al.
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Wavelength-modulated interferometric thermometry for improved substrate temperature measurement
- - K.L. Saenger
  - F. Tong
  - et al.
- 1992
- Review of Scientific Instruments
Study particle emission in vacuum from film deposits
- - Joseph S. Logan
  - James J. McGill
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Sub-μm, planarized, Nb-AlO_x-Nb Josephson process for 125 mm wafers developed in partnership with Si technology
- - M.B. Ketchen
  - D.J. Pearson
  - et al.
- 1991
- Applied Physics Letters
R.F. diode sputtering
- - Joseph S. Logan
- 1990
- Thin Solid Films
High rate radio frequency sputtering using in-phase plasma confinement
- - James E. Lucy
  - John Costable
  - et al.
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
A study of voids in sputtered Si02
- - Mitchell J. Hait
  - Harris C. Jones
  - et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
High-rate reactive sputter deposition of aluminum oxide
- - Fletcher Jones
  - Joseph Logan
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films