Study of end of range loop interactions with B+ implant damage using a boron doped diffusion layer
- J.K. Listebarger
- H.G. Robinson
- et al.
- 1995
- Journal of Applied Physics
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5 results for J. Slinkman
Shallow trench isolation double-diobe electrostatic discharge circuit and interaction with DRAM output circuitry
- Steven H. Voldman
- Vaughn P. Gross
- et al.
- 1993
- Journal of Electrostatics
Lateral dopant profiling on a 100 nm scale by scanning capacitance microscopy
- C.C. Williams
- J. Slinkman
- et al.
- 1990
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
The use of simulation in semiconductor technology development
- D.C. Cole
- E.M. Buturla
- et al.
- 1990
- Solid State Electronics
Lateral dopant profiling with 200 nm resolution by scanning capacitance microscopy
- C.C. Williams
- J. Slinkman
- et al.
- 1989
- Applied Physics Letters