Sensitive polysilane resists for bilayer lithography
- G.M. Wallraff
- R.D. Miller
- et al.
- 1991
- ACS Spring 1991
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10 results for Mark Baier
Polysilanes. Synthesis, structure and thermochromic behavior
- R.D. Miller
- G.M. Wallraff
- et al.
- 1991
- ACS Division of Polymer Chemistry Atlanta Meeting 1991
Structure of dialkyl and diaryl substituted organosilane polymers in solution
- P.M. Cotts
- P. Shukla
- et al.
- 1990
- ACS Division of Polymer Chemistry Washington DC Meeting 1990
Thermochromic behavior of unsymmetrical poly(alkylsilanes)
- G.M. Wallraff
- M. Baier
- et al.
- 1989
- ACS Division of Polymer Chemistry Miami Beach Meeting 1989
The electronic structure of high molecular weight substituted silane polymers in solution: Fluorescence quenching studies
- R.D. Miller
- M. Baier
- et al.
- 1992
- Pure and Applied Chemistry
Polysilane photoresists for 193 and 248 nm lithography
- G.M. Wallraff
- R.D. Miller
- et al.
- 1992
- J. Photopolym. Sci. Tech.
Electro-oxidation of some soluble alkyl and aryl substituted polysilane homopolymers
- A. Diaz
- M. Baier
- et al.
- 2019
- JES
Conformational Transition Studies of Organosilane Polymers by Light and Neutron Scattering
- Premal Shukla
- Patricia M. Cotts
- et al.
- 2002
- Macromolecules
Fluorescence quenching of poly(methylphenylsilane) in solution
- Gregory M. Wallraff
- Mark Baier
- et al.
- 1992
- Journal of Inorganic and Organometallic Polymers
The solution and solid-state thermochromism of unsymmetrically substituted polysilanes
- R.D. Miller
- G.M. Wallraff
- et al.
- 1991
- Journal of Inorganic and Organometallic Polymers