Post-exposure bake as a process-control parameter for chemically-amplffied photoresist
- John L. Sturtevant
- Steven J. Holmes
- et al.
- 1993
- Microlithography 1993
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4 results for Jerry C. Shaw
Modeling of optical alignment images for semiconductor structures
- Chi-Min Yuan
- Jerry Shaw
- et al.
- 1989
- Proceedings of SPIE 1989
Latent image measurements in electron beam exposed polymethylmethacrylate
- Jerry C. Shaw
- Stephen A. Rishton
- et al.
- 1991
- Applied Physics Letters
Metrology using differential phase contrast microscopy
- Jerry C. Shaw
- 1991
- Microelectronic Engineering