Sub-μm, planarized, Nb-AlOx-Nb Josephson process for 125 mm wafers developed in partnership with Si technology
- M.B. Ketchen
- D.J. Pearson
- et al.
- 1991
- Applied Physics Letters
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3 results for M. Smyth
Gel resist processing for submicron CMOS and bipolar circuits
- K.E. Petrillo
- M. Smyth
- et al.
- 1989
- Proceedings of SPIE 1989
PICOSECOND ELECTRICAL PULSES FOR VLSI ELECTRONICS CHARACTERIZATION.
- J.-M. Halbout
- P.G. May
- et al.
- 1986
- TMPEO 1986