A high performance epitaxial SiGe-base ECL BiCMOS technologyD.L. HarameE.F. Crabbeet al.1992IEDM 1992
Fabrication of Tungsten Local Interconnect for VLSI Bipolar TechnologyN.J. MazzeoJ.D. Warnocket al.1993JES
Diffusion barrier properties of TiN films for submicron silicon bipolar technologiesE. KobedaJ. Warnocket al.1992Journal of Applied Physics