Comparative study of CVD TiN vs. ALD TiN for contact metallization in 32nm node and beyond
- Valli Arunachalam
- Filippos Papadatos
- et al.
- 2010
- ADMETA 2010
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2 results for C.-H. Shin
Low resistivity tungsten for 32 nm node MOL contacts and beyond
- Filippos Papadatos
- Keith Wong
- et al.
- 2012
- Microelectronic Engineering