Cleans for Al vias in a 0.175 μm Dual Damascene Process
- J.P. Gambino
- L. Clevenger
- et al.
- 1999
- IITC 1999
Publications
Date
Featured collections
Popular topics
18 results for David Dobuzinsky
Selection of attenuated phase shift mask compatible contact hole resists for KrF optical lithography
- Zhijian G. Lu
- Yuping Cui
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Dielectric anti-reflection coating application in a 0.175 μm dual-damascene process
- G.Y. Lee
- Z.G. Lu
- et al.
- 1998
- IITC 1998
CVD of fluorosilicate glass for ULSI applications
- M.J. Shapiro
- S. Nguyen
- et al.
- 1995
- Thin Solid Films
Novel fingered stacked capacitor cell
- Tue Nguyen
- S. Nguyen
- et al.
- 1995
- JES
High Selectivity Magnetically Enhanced Reactive Ion Etching of Boron Nitride Films
- Bernhard Neureither
- Son Nguyen
- et al.
- 1994
- JES
Evidence of a shallow junction formation from plasma enhanced chemical vapor deposition of boron nitride and silicon boron nitride
- Tue Nguyen
- Son Van Nguyen
- et al.
- 1993
- Applied Physics Letters
New leakage mechanism in sub-5-nm oxynitride dielectrics
- Tue Nguyen
- Daniel A. Carl
- et al.
- 1993
- Applied Physics Letters