Quantitative measurement of resist outgassing during exposure
- Nicolae Maxim
- Frances A. Houle
- et al.
- 2009
- SPIE Advanced Lithography 2009
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2 results for W. Van Schaik
Quantification of outgassing of C-, Si-, and S-containing products during exposure of photoresists
- F.A. Houle
- N. Maxim
- et al.
- 2009
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures