A high-speed, high-sensitivity silicon lateral trench photodetector
- Min Yang
- Kern Rim
- et al.
- 2002
- IEEE Electron Device Letters
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4 results for Paul A. Rabidoux
Current Developments of a High Performance CA Resist for Mask Making Application
- Wu-Song Huang
- Wei He
- et al.
- 2003
- Photomask and Next-Generation Lithography Mask Technology 2003
Early mask results of KRS-XE and current progress in improving sensitivity and etch resistance
- Christina Deverich
- Andrew Watts
- et al.
- 2002
- Photomask and Next-Generation Lithography Mask Technology 2002
Use of KRS-XE positive chemically amplified resist for optical mask manufacturing
- Brian Ashe
- Christina Deverich
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering