Publications

90 results for Meikei Ieong

Effect of contact liner stress in high-performance FDSOI devices with ultra-thin silicon channels and 30 nm gate lengths
- - D. Singh
  - J. Hergenrother
  - et al.
- 2005
- IEEE International SOI Conference 2005
Assembly technology for three dimensional integrated circuits
- - A. Topol
  - D.C. La Tulipe
  - et al.
- 2005
- VMIC 2005
Selective epitaxial channel ground plane thin SOI CMOS devices
- - Zhibin Ren
  - M. Ieong
  - et al.
- 2005
- IEDM 2005
Systematic study of workfunction engineering and scavenging effect using NiSi alloy FUSI metal gates with advanced gate stacks
- - Y.-H. Kim
  - C. Cabral Jr.
  - et al.
- 2005
- IEDM 2005
Enabling SOI-based assembly technology for three-dimensional (3D) integrated circuits (ICs)
- - A. Topol
  - D.C. La Tulipe
  - et al.
- 2005
- IEDM 2005
Poly-Si/high-k gate stacks with near-ideal threshold voltage and mobility
- - M.M. Frank
  - V.K. Paruchuri
  - et al.
- 2005
- VLSI-TSA 2005
Characteristics of high performance PFETs with embedded SiGe source/drain and 〈100〉 channels on 45° rotated wafers
- - Qiqing Ouyang
  - Meikei Ieong
  - et al.
- 2005
- VLSI Technology 2005
A comparative study of NBTI as a function of Si substrate orientation and gate dielectrics (SiON and SiON/HfO ₂)
- - S. Zafar
  - M. Yang
  - et al.
- 2005
- VLSI Technology 2005
Ultra-thin SOI replacement gate CMOS with ALD TaN / high-k gate stack
- - B. Doris
  - B.P. Linder
  - et al.
- 2005
- VLSI-TSA 2005
On the scalability and carrier transport of advanced CMOS devices
- - Meikei Ieong
  - Leland Chang
  - et al.
- 2005
- ICICDT 2005