CD optimization methodology for extending optical lithography
- C. Wong
- G. Seevaratnam
- et al.
- 2013
- SPIE Advanced Lithography 2013
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3 results for Pawan Rawat
Simultaneous measurement of optical properties and geometry of resist using multiple scatterometry gratings
- Alok Vaid
- Matthew Sendelbach
- et al.
- 2010
- SPIE Advanced Lithography 2010
Simultaneous measurement of optical properties and geometry of resist using multiple scatterometry targets
- Alok Vaid
- Matthew Sendelbach
- et al.
- 2010
- Journal of Micro/Nanolithography, MEMS, and MOEMS