CD optimization methodology for extending optical lithography
- C. Wong
- G. Seevaratnam
- et al.
- 2013
- SPIE Advanced Lithography 2013
Publications
Date
Featured collections
Popular topics
3 results for E. Rottenkolber
Advanced overlay control in volume manufacturing
- Timothy Wiltshire
- Christopher Ausschnitt
- et al.
- 2011
- ASMC 2011
Synthesis and control of ultra thin gate oxides for the 90 and 65 NM nodes
- Joseph F. Shepard Jr.
- Anthony Chou
- et al.
- 2005
- RTP 2005