Resist freezing process for double exposure lithography
- Kuang-Jung Rex Chen
- Wu-Song Huang
- et al.
- 2008
- SPIE Advanced Lithography 2008
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3 results for Kuang-Jung Rex Chen
Investigation on the mechanism of the 193nm resist linewidth reduction during the SEM measurement
- C.-H.J. Wu
- Wu-Song Huang
- et al.
- 2001
- Microlithography 2001
Selection of attenuated phase shift mask compatible contact hole resists for KrF optical lithography
- Zhijian G. Lu
- Yuping Cui
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999