Publications

2 results for Warren Montgomery

Are extreme ultraviolet resists ready for the 32 nm node?
- - Karen Petrillo
  - Yayi Wei
  - et al.
- 2007
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Initial experience establishing a EUV baseline lithography process for manufacturability assessment
- - O.R. Wood II
  - D. Back
  - et al.
- 2007
- SPIE Advanced Lithography 2007