Modeling for profile-based process-window metrology
- Christopher P. Ausschnitt
- Shaunee Y. Cheng
- 2004
- Microlithography 2004
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15 results for Christopher Ausschnitt
A new approach to pattern metrology
- Christopher P. Ausschnitt
- 2004
- SPIE Advanced Lithography 2004
Process window metrology
- Christopher P. Ausschnitt
- W. Chu
- et al.
- 2000
- SPIE Advanced Lithography 2000
Optimization of resolution-enhanced photolithography for a 256Mb DRAM cell
- R. Ferguson
- Christopher P. Ausschnitt
- et al.
- 1994
- VLSI Technology 1994
Quantitative stepper metrology using the focus monitor test mask
- T.A. Brunner
- A.L. Martin
- et al.
- 1994
- Microlithography 1994