Taming pattern and focus variation in VLSI design
- Fook-Luen Heng
- Puneet Gupta
- et al.
- 2004
- AMM 2004
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39 results for Kafai Lai
Optimum mask and source patterns to print a given shape
- Alan E. Rosenbluth
- Rama N. Singh
- et al.
- 2002
- Journal of Microlithography, Microfabrication and Microsystems
Methodology for generating exposure tool specification for alternating phase shift mask application for 70 nm node
- Kafai Lai
- Gregg Gallatin
- et al.
- 2002
- SPIE Advanced Lithography 2002
Scattered light: The increasing problem for 193 nm exposure tools and beyond
- Kafai Lai
- Chung-Hsi Wu
- et al.
- 2001
- Microlithography 2001
Review of computational lithography modeling: Focusing on extending optical lithography and design-technology co-optimization
- Kafai Lai
- 2012
- Advanced Optical Technologies
Design technology co-optimization assessment for directed self-Assembly-based lithography: Design for directed self-Assembly or directed self-Assembly for design
- Kafai Lai
- Chi Chun Liu
- et al.
- 2017
- J. Micro/Nanolithogr. MEMS MOEMS
Computational lithography: Exhausting the resolution limits of 193-nm projection lithography systems
- David O. S. Melville
- Alan E. Rosenbluth
- et al.
- 2011
- Journal of Vacuum Science and Technology B
Critical impact of mask electromagnetic effects on optical proximity corrections performance for 45 nm and beyond
- Jaione Tirapu Azpiroz
- Alan E. Rosenbluth
- et al.
- 2007
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Optimum mask and source patterns to print a given shape
- Alan E. Rosenbluth
- Scott Bukofsky
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering