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39 results for Kafai Lai

Critical impact of mask electromagnetic effects on optical proximity corrections performance for 45 nm and beyond
- - Jaione Tirapu Azpiroz
  - Alan E. Rosenbluth
  - et al.
- 2007
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Topics in polarization ray tracing for image projectors
- - Alan E. Rosenbluth
  - Gregg Gallatin
  - et al.
- 2005
- SPIE Optics + Photonics 2005
Assessing the impact of intrinsic birefringence on 157nm lithography
- - Nakgeuon Seong
  - Kafai Lai
  - et al.
- 2004
- SPIE Advanced Lithography 2004
Fast calculation of images for high numerical aperture lithography
- - Alan E. Rosenbluth
  - Gregg Gallatin
  - et al.
- 2004
- SPIE Advanced Lithography 2004
Taming pattern and focus variation in VLSI design
- - Fook-Luen Heng
  - Puneet Gupta
  - et al.
- 2004
- AMM 2004
Optimum mask and source patterns to print a given shape
- - Alan E. Rosenbluth
  - Rama N. Singh
  - et al.
- 2002
- Journal of Microlithography, Microfabrication and Microsystems
Methodology for generating exposure tool specification for alternating phase shift mask application for 70 nm node
- - Kafai Lai
  - Gregg Gallatin
  - et al.
- 2002
- SPIE Advanced Lithography 2002
Scattered light: The increasing problem for 193 nm exposure tools and beyond
- - Kafai Lai
  - Chung-Hsi Wu
  - et al.
- 2001
- Microlithography 2001
Optimum mask and source patterns to print a given shape
- - Alan E. Rosenbluth
  - Scott Bukofsky
  - et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering