A 300-mm wafer-level three-dimensional integration scheme using tungsten through-silicon via and hybrid cu-adhesive bondingF. LiuR.R. Yuet al.2008IEDM 2008
Optimizing Models Based OPC fragmentation using genetic algorithmsDomenico A. DipaolaIan Mobert2008SPIE Photomask Technology + EUV Lithography 2008