Incorporating process variation contours in design rule calculation and SRAM design optimizationDongbing ShaoJing Shaet al.2019SPIE Advanced Lithography 2019
Layout based Monte-Carlo simulation (LBMCS) for complex back end of line (BEOL) design rule studyDongbing ShaoLawrence Clevengeret al.2017IITC 2017
Identification and sensitivity analysis of a correlated ground rule system (design arc)Eric EastmanDureseti Chidambarraoet al.2017SPIE Advanced Lithography 2017