Asymmetric Energy Distribution of Interface Traps in n- and p-MOSFETs with HfO2 Gate Dielectric on Ultrathin SiON Buffer LayerJ.-P. HanE.M. Vogelet al.2004IEEE Electron Device Letters
Reverse short channel effects in high-k gated nMOSFETsJ.-P. HanS.M. Kooet al.2005Microelectronics Reliability
Energy Distribution of Interface Traps in High-K Gated MOSFETsJ.-P. HanE.M. Vogelet al.2003VLSI Technology 2003