Hydrogen bonding and aqueous base dissolution behavior of hexafluoroisopropanol-bearing polymers
- Hiroshi Ito
- William D. Hinsberg
- et al.
- 2003
- Microlithography 2003
Publications
Date
Featured collections
Popular topics
5 results for L.F. Rhodes
Reactive ion etching of 193-nm resist candidates: Current platforms and future requirements
- Thomas I. Wallow
- Phillip J. Brock
- et al.
- 1998
- Microlithography 1998
Design of an etch-resistant cyclic olefin photoresist
- Robert D. Allen
- Juliann Opitz
- et al.
- 1998
- Microlithography 1998
Fluoropolymer resists: Fundamentals and lithographic evaluation
- Hiroshi Ito
- H.D. Truong
- et al.
- 2004
- J. Photopolym. Sci. Tech.
Platform-dependent properties of 193nm single layer resists
- Robert D. Allen
- Thomas I. Wallow
- et al.
- 1998
- J. Photopolym. Sci. Tech.